Business
MPIA®(SPOES)
Superior stability, compact, high sensitivity
MPIA offers advanced anti contaminated features in a compact, lightweight that is easily installable, allowing for accurate and high sensitivity. MPIA is designed to unlock your process with SCM s/w frame for all of your gas analysis to help maximize yeilds and minimize tool downtime. As next smart sensor, it overcomes contamination issue of SPOES.
MPIA® Advantages
- Strong anti contamination
- The smallest size
- Strong plasma intensity
- High Sensitivity
- Simulation Function – Raw Data reprocess
MPIA® Applications
- Leak Detection
- Fault Detection
- Optimization of Cleaning/Seasoning time
- Abnormal Chemical Status (in Real Time)
- First wafer effect & Process Drift
Smart Sensor Operation SW (SCM™)
- Remote Control & Monitoring(Office Access)
- Interface with EQ or FAB FDC(Host)
- SW Flexibility for Adding Sensors
- Feed back to EQ in real time by Pre-defined cases
- Easy Way for Long Term data(DB)
- Various Analysis
MPIA® VS SPOES Differences
MPIA® & SPOES Contamination Test
MPIA® & SPOES Contamination
| Model | BitOn-5000 | BitOn-5000 | BitOn-5000 | BitOn-4500 BitOn-5000AD |
|---|---|---|---|---|
| Type | Normal | LP | HP | Discontinued |
| Operation Pressure | 5mTorr ~ 10mTorr | 1mTorr ~ 10Torr | 3Torr ~ 10Torr | |
| Application | TEOS ALD W Ti/TiN ACL SIO2 |
TEOS ALD W Ti/TiN ACL SIO2 |
TEOS ALD W Ti/TiN ACL SIO2 |
|
| Customer | Semiconductor & Display | |||
| Sale | On Sale | On Sale | On Sale | End of sales |
Pumping period (Fore Line GAS Build up Issue)
First Wafer Effect Detection & Continuous Process Lot trend
Lot wafer Summary - Process Step Trend (A Specific Wavelength)
