Business
Reliable Optical Endpoint Detection Systems
VEP™ Series are stable and well-defined s/w frame with various functions. We provide integrated solutions for epd, process chamber status ,film thickness measuement and cleanning optimization. We have three type products : VEP™-G&A / VEP™-Mono / VEP™-IEP
VEP™
To keep integrity of the stop layer and etch to a remaining amount of material, We need to know the endpoint. VEP™ was designed for detecting precise end point detection. Also we provide integrated solutions for gas chemistry changes through the optical emission.
Characteristics
- Trace the selected wavelength intensity
- End Point Detecting Function by pre-defined rule
- Optical Emission Spectra-scope Function
- Signal processing (Virtual data generation)
- Simulation Function – Raw Data reprocess
- Spectrum Libraries of Chemical Elements
- Advanced algorithm - PCA/HMM
- Plasma Triggered Process control
- Run info achieved by VEP™ own Interface or SECS/GEM & HSMS
- Customize EQ interface.
Classification
There are two types of VEP™ according to CCD : VEP™-Genearl & VEP™-Advanced
| General | Advanced | |
|---|---|---|
| Size | 162 X 140 X 70 | 215 X 184 X 142 |
| Resolution | (Slit/10um): 2.0nm | (Slit/10um): 2.0nm |
| Pixel | 2048 | 2048 |
| Wavelength | UV/VIS | UV/VIS |
| CCD Type | Normal Array CCD | Back-thinned CCD |
| Interface | LAN | LAN |
| Controller | Each Chamber | Each Chamber |
| Application | EPD | EPD |
VEP™ - MONO
VEP-Mono is designed for replacing monochromator type epd called old epd system. Legacy Monochromators has several problems like general maintenance and data analysis. If you have a defect wafer and would like to know detailed main cause, it is difficult to analyze what the problem is.
Advantages
| ITEM | Monochrometer | VEP™-Mono |
|---|---|---|
| Chamber Down Time | Happen by EPD Fail | No |
| Defect Wafer | Happen by EPD Fail | No |
| Plasma Monitoring | Only specific wavelength | Full Wavelength |
| Analysis Tool | No | Yes |
| FDC co-relation | No | Support |
| System Performance | Old System | New System |
| Leak Detection | No | Yes |
| Mechanical Parts | Exist | No |
| Support (H/W & S/W) | Poor | Good |
| Maintenance | Need | No Need |
Characteristics
Flexibilities - Parallel Usage ESM allows operation the old Monochromator EPD and VEP™-Mono together
VEP™ - IEP (Insitu-Thickness Monitoring)
VEP™ IEP is designed for a wide variety of film thickness and depth measurement in real time required ETCH, CVD and CMP process. VEP™-IEP calculates the etching and coating speed of the monitored area by the interference intensity.
